There are three specific methods: multi target sputtering, Mosaic target sputtering and alloy target sputtering. HARMONIC vacuum evaporation of HARMONIC CSF-25-100-2UH these methods are all dc sputtering and only suitable for conductive targets. Compound film usually refers to the compound of metal elements into thin films, coating methods include DC sputtering, rf sputtering and reactive sputtering.

Ion plating ion plating is a kind of coating technology developed on HARMONIC CSF-25-100-2UH, which is the base of vacuum evaporation and sputtering coating. During ion plating, the workpiece is bombarded not only by atoms sputtered from the target but also by ions. This ion flow can be composed of ions or high-energy neutral ions formed by energy exchange. This kind of bombardment causes some changes in the properties of the interface and the film, such as the adhesion of the film to the substrate HARMONIC vacuum evaporation HARMONIC CSF-25-100-2UH, coverage, density and internal stress, so that the ion plating has many advantages.