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RPS AX7695 MKS Remote Plasma Source

Purchase Qty. / Reference FOB Price
1 piece US $
Production Capacity: 1123
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Basic Info

  RPS AX7695 MKS Remote Plasma Source

  Model:RPS AX7695

  Brand:MKS

  Manufacturer:MKS

  Series:Control Power Supply

  Product Description

  RPS AX7695 MKS Remote Plasma Source

  Product Name:MKS RPS AX7695 Remote Plasma Source

  Series:RPS Series

  Function:Generate high-density and uniform plasma for various applications such as material modification,surface treatment,and thin film deposition.

  Usage:

  Semiconductor manufacturing:wafer cleaning,etching,deposition,etc

  Photovoltaic manufacturing:glass cleaning,coating,etc

  Display manufacturing:etching,deposition,etc

  Other:biomedical,aerospace,automotive manufacturing,etc

  Features:

  High density,uniform plasma

  Controllable plasma parameters

  Stable operation

  Easy to maintain

  Product Description:

  MKS RPS AX7695 Remote Plasma Source is a high-performance and highly reliable remote plasma source manufactured using advanced radio frequency(RF)technology and microwave technology.It has the characteristics of high density,uniform plasma,controllable plasma parameters,stable operation,and easy maintenance,and can be widely used in various fields such as semiconductor manufacturing,photovoltaic manufacturing,and display manufacturing.

  Product Description:

  The MKS RPS AX7695 remote plasma source consists of a power supply,matching network,plasma cavity,etc.The power supply generates high-frequency or microwave energy,which is transmitted to the plasma cavity through a matching network.In the plasma cavity,the electromagnetic field excites the gas into plasma.Plasma is directed towards the target surface through the plasma outlet for material modification,surface treatment,thin film deposition,and other operations.

  Product parameters:

  Model:RPS AX7695

  Frequency:13.56 MHz

  Power:2 kW

  Plasma density:>10^12 cm^-3

  Plasma uniformity:<5%

  Product specifications:

  Dimensions:600 mm x 400 mm x 300 mm

  Weight:20 kg

  Application field:

  The MKS RPS AX7695 remote plasma source is widely used in the following fields:

  Semiconductor manufacturing:wafer cleaning,etching,deposition,etc

  Photovoltaic manufacturing:glass cleaning,coating,etc

  Display manufacturing:etching,deposition,etc

  Other:biomedical,aerospace,automotive manufacturing,etc

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