Processing room
and vacuum exhaust system Chamber Sharpφ260mm Spherical SUS
Reaching vacuum Less than6.7×10-7Pa (5×10-9Torr)
Ceramic bearing
turbo pump 250L/s
Target revolution unit φ20mm×6 axes
Rotation / revolution motor drive (PC control)
Substrate heating unit Infrared lamp substrate heating unit (can be changed to semiconductor
laser substrate heating unit)
Size of substrate 10mm
Maximum
heating temperature Above 800℃
Common specification Power supply / control rack (JIS standard compliant) integrated chamber frame
PLD automatic control system (PC and control software)